Laser Lithography
The DWL 66 laser lithography system is an economical, high resolution pattern generator for low volume mask making and direct writing.
- Applicable for mask making or direct exposure on basically any flat material coated with photo resist.
- Numerous optional features increase the flexibility and make the system suitable for more applications.
- Substrates up to: 6 Inch
- Laser writing wavelength: 405nm
- Resolution: 0.7μm
